Y. Lee wins the best paper award in the 5th Nano-Imp Forum, 2015, Korea, with "Large Scale UV Lithography using Optically Patternable Metamaterial"  |
Lab News >
Recent Publication This work presents ultrathin silicon nanohole membrane, realizing a highly resolvable resonance shift depending on the surround index change by using electromagnetic resonance at NIR. We strongly believe that this nanophotonic device can extend the sphere of meta-device as a more practical application and will provide a new direction for manipulating electromagnetic field in NIR
|
|